Effect of post annealing treatment on electrochromic properties of spray deposited niobium oxide thin films

被引：47
|
作者：
Mujawar, S. H.
Inamdar, A. I.
Betty, C. A.
Ganesan, V.
Patil, P. S. [1 ]
机构：
[1] Shivaji Univ, Dept Phys, Thin Film Mat Lab, Kolhapur 416004, Maharashtra, India
[2] Bhabha Atom Res Ctr, Div Chem, Bombay 400085, Maharashtra, India
[3] UGC DAE Consortium Sci Res, Indore 452017, India
来源：
ELECTROCHIMICA ACTA | 2007年 / 52卷 / 15期
关键词：
niobium oxide thin films; spray pyrolysis technique; scanning electron microscopy (SEM); X-ray diffraction (XRD); atomic force microscopy (AFM);
D O I：
10.1016/j.electacta.2007.01.054
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Niobium oxide thin films were deposited on the glass and fluorine doped tin oxide (FTO) coated glass substrates using simple and inexpensive spray pyrolysis technique. During deposition of the films various process parameters like nozzle to substrate distance, spray rate, concentration of sprayed solution were optimized to obtain well adherent and transparent films. The films prepared were further annealed and effect of post annealing on the structural, morphological, optical and electrochromic properties was studied. Structural and morphological characterizations of the films were carried out using scanning electron microscopy, atomic force microscopy and X-ray diffraction techniques. Electrochemical properties of the niobium oxide thin films were studied by using cyclic-voltammetry, chronoamperometry and chronocoulometry. (c) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码：4899 / 4906
页数：8
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