Characterization of trace embedded impurities in thin multilayer structures using synchrotron X-ray standing waves

被引：8
|
作者：
Tiwari, M. K. [1 ,2 ]
Sawhney, K. J. S. [1 ]
Lodha, G. S. [2 ]
机构：
[1] Diamond Light Source Ltd, Didcot OX11 0DE, Oxon, England
[2] Raja Ramanna Ctr Adv Technol, Indus Synchrotron Utilizat Div, Indore 452013, Madhya Pradesh, India
来源：
SURFACE AND INTERFACE ANALYSIS | 2010年 / 42卷 / 02期
关键词：
X-ray multilayers; X-ray standing wave; X-ray fluorescence; atomic impurities; synchrotron radiation; GIANT MAGNETORESISTANCE; SPUTTERING YIELDS; LAYERED MATERIALS; FLUORESCENCE; SPECTROMETRY; RADIATION; SURFACE;
D O I：
10.1002/sia.3178
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
X-ray standing wave (XSW) field generated under Bragg reflection condition in a periodic Mo/Si multilayer structure has been used to determine the concentration and location of various trace element contaminants embedded in different layers of that multilayer structure. We have used intense synchrotron X rays for XSW analysis. It is observed that various trace element impurities such as Cr, Fe, Ni and W get embedded unintentionally in the multilayer structure during the deposition process. Consequences of such impurity incorporation on the optical properties of the multilayer structure are discussed in hard and soft X-ray regions. Present measurements are important in order to optimize the deposition methods on one hand and to better correlate the measured optical properties of a multilayer structure with theoretical models on the other. Copyright (C) 2010 John Wiley & Sons, Ltd.
引用
收藏
页码：110 / 116
页数：7
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