Patterning of amorphous and polycrystalline Ni78B14Si8 with a focused-ion-beam

被引:27
|
作者
Li, Wuxia
Minev, Roussi
Dimov, Stefan
Lalev, Georgi
机构
[1] UCL, London Ctr Nanotechnol, London WC1E 7JE, England
[2] Cardiff Univ, Mfg Engn Ctr, Cardiff CF24 3AA, Wales
基金
英国工程与自然科学研究理事会;
关键词
focused-ion-beam; patterning; Ni78B14Si8; alloys; micro/nano-tooling;
D O I
10.1016/j.apsusc.2006.12.018
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The machining response of amorphous and crystalline Ni78B14Si8 was investigated when structuring substrates using focused-ion-beam (FIB) milling. In particular, the sputtering yield as a function of the scan speed, and the effects of ion fluence and scan speed on the milled depth were studied. The ion fluence dependent evolution of the cross-sectional profiles of trenches was examined by atomic force microscopy (AFM). When milling amorphous Ni78B14Si8 it was found that the sputtering yield first decreased with increasing the beam scan speed, then kept constant within the scan speed range, up to 710 nm/s, investigated in this work; it was also found that the milled depth was almost proportional to the ion beam fluence. The patterning of polycrystalline Ni78B14Si8 resulted in anisotropic milling-rates due to the varying orientation of the grains in the material. The analysis of the profile evolution in both materials indicated that the surface finish of trenches was scan speed, ion beam fluence and scan strategy dependent. The study demonstrated that direct patterning by FIB could be used for producing masters in amorphous Ni-based alloys for injection moulding and hot embossing. (C) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:5404 / 5410
页数:7
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