Use of sublimation epitaxy for obtaining volume 3C-SiC crystals

被引:0
|
作者
Lebedev, A. A. [1 ]
Abramov, P. L. [1 ]
Zubrilov, A. S. [1 ]
Bogdanova, E. V. [1 ]
Lebedev, S. P. [1 ]
Seredova, N. V. [1 ]
Tregubova, A. S. [1 ]
机构
[1] Russian Acad Sci, AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
关键词
SILICON-CARBIDE; SINGLE-CRYSTALS; GROWTH;
D O I
10.1134/S1063785010060258
中图分类号
O59 [应用物理学];
学科分类号
摘要
It is demonstrated that polytype-homogeneous, thick (> 100 mu m) epitaxial 3C-SiC layers of good structural quality with diameters of no less than 25 mm can be grown on 6H-SiC substrates by sublimation epitaxy in vacuum. These layers can be used as seeds for growing volume 3C-SiC crystals by the modified Lely method.
引用
收藏
页码:574 / 576
页数:3
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