XPS and SEM characterization of zirconia thin films prepared by electrochemical deposition

被引:1
|
作者
Stefanov, P
Stoychev, D
Stoycheva, M
Ikonomov, J
Marinova, T [1 ]
机构
[1] Bulgarian Acad Sci, Inst Gen & Inorgan Chem, BU-1113 Sofia, Bulgaria
[2] Bulgarian Acad Sci, Inst Phys Chem, BU-1113 Sofia, Bulgaria
关键词
XPS; SEM; stainless steel; electrodeposition; zirconia;
D O I
10.1002/1096-9918(200008)30:1<628::AID-SIA800>3.0.CO;2-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Electrochemical deposition of zirconia on stainless steel has been investigated in order to provide supports of catalysts for NOx reduction. The zirconia films have been obtained in electrolytes based on anhydrons ethyl alcohol. The structure and chemical composition of the films have been characterized by SEM and XPS depth profiling. With rising cathodic voltage, the structure and morphology exhibit essential changes. The most porous structure corresponds to films formed at 21 V, whereas the highest density is achieved at 25 V, The XPS depth profiling data show that the composition in the bulk of the films is close to stoichiometric, The cross-section of an annealed film gives evidence for good adhesion to the substrate, The film thickness is 3-10 mu m, After annealing in air at 550 degrees C for 1 h, no cracks and inhomogeneities are observed. Copyright (C) 2000 John Wiley & Sons, Ltd.
引用
收藏
页码:628 / 631
页数:4
相关论文
共 50 条
  • [31] Characterization of thin Co/ZrO2 catalytic films by XPS, SEM and SAM
    Stefanov, P
    Atanasova, G
    Robinson, K
    Julbe, A
    Guizard, C
    O'Hara, P
    Marinova, T
    SURFACE AND INTERFACE ANALYSIS, 2002, 34 (01) : 84 - 87
  • [32] Transparent conductive properties of ZnO thin films prepared by electrochemical deposition
    He, Y.-Q. (heyuqiu@Tongji.edu.com), 1600, Editorial Office of Chinese Optics (34):
  • [33] CHARACTERIZATION OF THIN ALUMINA FILMS PREPARED BY METAL-ORGANIC CHEMICAL-VAPOR-DEPOSITION (MOCVD) BY HIGH-RESOLUTION SEM, (AR)XPS AND AES DEPTH PROFILING
    LISOWSKI, W
    VANDENBERG, AHJ
    SMITHERS, M
    HAANAPPEL, VAC
    FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1995, 353 (5-8): : 707 - 712
  • [35] Characterization and electrochemical properties of LiMn2O4 thin films prepared by solution deposition
    Wu X.
    He Z.
    Xu M.
    Li X.
    Xiao Z.
    Journal Wuhan University of Technology, Materials Science Edition, 2006, 21 (03): : 54 - 56
  • [36] Characterization and electrochemical properties of LiMn2O4 thin films prepared by solution deposition
    Wu Xianming
    He Zeqiang
    Xu Mingfei
    Li Xinhai
    Xiao Zhuobing
    JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2006, 21 (03): : 54 - 56
  • [37] Deposition and characterization of alpha alumina thin films prepared by chemical bath deposition
    Kathirvel, P.
    Chandrasekaran, J.
    Manoharan, D.
    Kumar, S.
    OPTIK, 2015, 126 (19): : 2177 - 2179
  • [38] Deposition and characterization of Ru thin films prepared by metallorganic chemical vapor deposition
    Kang, SY
    Choi, KH
    Lee, SK
    Hwang, CS
    Kim, HJ
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2000, 37 (06) : 1040 - 1044
  • [39] XPS characterization of beryllium carbide thin films formed via plasma deposition
    Xie, YX
    Morosoff, NC
    James, WJ
    JOURNAL OF NUCLEAR MATERIALS, 2001, 289 (1-2) : 48 - 51
  • [40] TiO2 Thin Films by Chemical Vapor Deposition: An XPS Characterization
    Barreca, Davide
    Gasparotto, Alberto
    Maccato, Chiara
    Maragno, Cinzia
    Tondello, Eugenio
    SURFACE SCIENCE SPECTRA, 2007, 14 (01): : 27 - 33