Deposition and characterization of alpha alumina thin films prepared by chemical bath deposition

被引：7

作者：

Kathirvel, P. ^{[1
]}

Chandrasekaran, J. ^{[2
]}

Manoharan, D. ^{[2
]}

Kumar, S. ^{[3
]}

机构：

[1] Amrita Vishwa Vidyapeetham, Sch Engn, Dept Sci, Coimbatore 641112, Tamil Nadu, India

[2] Sri Ramakrishna Mission Vidyalaya Coll Arts & Sci, Dept Phys, Coimbatore 641020, Tamil Nadu, India

[3] Int Adv Res Ctr Power Met & New Mat ARCI, Ctr Engineered Coatings, Hyderabad 500005, Andhra Pradesh, India

来源：

OPTIK | 2015年 / 126卷 / 19期

关键词：

Thin films; Alpha alumina; XRD; SEM; SPRAY-PYROLYSIS; NANOPARTICLES;

D O I：

10.1016/j.ijleo.2015.05.112

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Alpha alumina thin film has been deposited on glass substrate by simple chemical bath deposition technique at 60 degrees C. The structure and the crystallinity of the alpha alumina thin film were determined by X-ray diffraction and the grain size calculated from X-ray diffraction was 85 nm. The optical band gap of the film measured from UV-visible spectroscopy was 4.5 eV. The surface morphology of the film was traced by scanning electron microscopy and photoluminescence spectrum of the film shows that the presence of oxygen vacancies. (C) 2015 Elsevier GmbH. All rights reserved.

引用

页码：2177 / 2179

页数：3

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