Etching properties of DLC films prepared by the CVD method - An application of DLC films to the IC fabrication process

被引:0
|
作者
Komatsu, Y [1 ]
Alanazi, A [1 ]
Hirakuri, KK [1 ]
机构
[1] Tokyo Denki Univ, Fac Sci & Engn, Dept Appl Elect, Hatoyama, Saitama 35003, Japan
来源
DIAMOND FILMS AND TECHNOLOGY | 1997年 / 7卷 / 5-6期
关键词
CVD; DLC film; IC fabrication process; etching; resist material;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:321 / 324
页数:4
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