Etching properties of DLC films prepared by the CVD method - An application of DLC films to the IC fabrication process

被引：0
|
作者：
Komatsu, Y [1 ]
Alanazi, A [1 ]
Hirakuri, KK [1 ]
机构：
[1] Tokyo Denki Univ, Fac Sci & Engn, Dept Appl Elect, Hatoyama, Saitama 35003, Japan
来源：
DIAMOND FILMS AND TECHNOLOGY | 1997年 / 7卷 / 5-6期
关键词：
CVD; DLC film; IC fabrication process; etching; resist material;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：321 / 324
页数：4
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