Preparation and characterization of nano-crystalline diamond films on glass substrate

被引：0
|
作者：
Lu, FX [1 ]
Yang, WB [1 ]
Liu, ZL [1 ]
Tang, WZ [1 ]
Tong, YM [1 ]
机构：
[1] Univ Sci & Technol Beijing, Sch Mat Sci & Engn, Beijing 100083, Peoples R China
来源：
JOURNAL OF UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING | 2004年 / 11卷 / 03期
关键词：
nano diamond films; microwave plasma assisted CVD; characterization; glass substrate;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Adherent nano diamond films were successfully deposited on glass substrate by microwave plasma assisted CVD method in H-2-CH4 and Ar-CH4 environment. Raman, AFM (Atomic Force Microscope), TEM (Transmission Electron Microscope), FTIR, and Nano Indentation techniques were used for characterization of the obtained nano diamond films. It was found that the average grain size was less than 100 run with a surface roughness value as low as 2 nm. The nano diamond films were found to have excellent transparency in visible and IR spectrum range, and were as hard as natural diamond. Experimental results were presented. Mechanisms for nano diamond film deposition were discussed.
引用
收藏
页码：216 / 220
页数：5
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