Molecular dynamics simulation of gold cluster growth during sputter deposition

被引：29

作者：

Abraham, J. W. ^{[1
]}

Strunskus, T. ^{[2
]}

Faupel, F. ^{[2
]}

Bonitz, M. ^{[1
]}

机构：

[1] Univ Kiel, Inst Theoret Phys & Astrophys, Leibnizstr 15, D-24098 Kiel, Germany

[2] Univ Kiel, Inst Mat Wissensch, Lehrstuhl Mat Verbunde, Kaiserstr 2, D-24143 Kiel, Germany

来源：

JOURNAL OF APPLIED PHYSICS | 2016年 / 119卷 / 18期

关键词：

THIN-FILM GROWTH; X-RAY-SCATTERING; METAL-POLYMER NANOCOMPOSITES; EMBEDDED-ATOM-METHOD; CONDENSATION COEFFICIENTS; INFREQUENT EVENTS; NOBLE-METALS; DIFFUSION; AG; TEMPERATURE;

D O I：

10.1063/1.4948375

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present a molecular dynamics simulation scheme that we apply to study the time evolution of the self-organized growth process of metal cluster assemblies formed by sputter-deposited gold atoms on a planar surface. The simulation model incorporates the characteristics of the plasma-assisted deposition process and allows for an investigation over a wide range of deposition parameters. It is used to obtain data for the cluster properties which can directly be compared with recently published experimental data for gold on polystyrene [M. Schwartzkopf et al., ACS Appl. Mater. Interfaces 7, 13547 (2015)]. While good agreement is found between the two, the simulations additionally provide valuable time-dependent real-space data of the surface morphology, some of whose details are hidden in the reciprocal-space scattering images that were used for the experimental analysis. Published by AIP Publishing.

引用

页数：11

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