Molecular dynamics studies of thin film growth by ionized cluster beam deposition

被引:7
|
作者
Yorizane, K [1 ]
Yamamura, Y [1 ]
机构
[1] Okayama Univ Sci, Okayama 7000005, Japan
关键词
D O I
10.1016/S0927-0256(98)00114-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The mechanism of thin-film growth by ionized cluster beam deposition (ICBD) has been investigated, using molecular dynamics (MD) simulations with the hybrid interatomic potentials which have been developed by combining the embedded-atom-method (EAM) potentials with the screened Coulomb average modified Lenz-Jensen (AMLJ) potential. In order to clarify the conversion mechanism of cluster energy into surface migration energy in ICED, we have investigated the cluster impact phenomena for Cu-201 impact on Cu (1 1 1) and Pt (1 1 1) with a cluster energy of 5 eV/atom, For a Cu-201 impact on a Pt (1 1 1), a half of cluster atoms migrated on the substrate surface with relatively high migration energies. On the other hand, for a Cu-201 impact on a Cu(1 1 1), most of the cluster atoms are embedded into the substrate, and a small amount of them migrate with small migration energies. In the conversion mechanism of cluster energy into surface migration energy in ICED, the most important point is whether the high-density zone is formed in the central part of the cluster, above or below the surface. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:241 / 247
页数:7
相关论文
共 50 条
  • [1] Molecular dynamics simulation for ionized cluster beam deposition
    Kang, HJ
    Lee, MW
    Kim, JH
    Whang, CN
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 121 (1-4): : 53 - 57
  • [2] IONIZED CLUSTER BEAM TECHNIQUE FOR THIN-FILM DEPOSITION
    TAKAGI, T
    [J]. ZEITSCHRIFT FUR PHYSIK D-ATOMS MOLECULES AND CLUSTERS, 1986, 3 (2-3): : 271 - 278
  • [3] Recent developments in ionized cluster beam thin film deposition
    Cox, AJ
    Nainaparampil, JJ
    Tabet, MF
    HosseiniTehrani, A
    Urban, FK
    [J]. THIN SOLID FILMS, 1995, 270 (1-2) : 637 - 642
  • [4] COMPUTER STUDIES OF IONIZED CLUSTER BEAM DEPOSITION
    YAMAMURA, Y
    YAMADA, I
    TAKAGI, T
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 : 902 - 905
  • [5] Molecular dynamics simulations of ionized cluster beam deposition: case of study of aluminum
    Kang, JW
    Hwang, HJ
    [J]. COMPUTATIONAL MATERIALS SCIENCE, 2001, 21 (04) : 509 - 514
  • [6] IONIZED CLUSTER BEAM DEPOSITION AND THIN INSULATING FILMS
    SOSNOWSKI, M
    YAMADA, I
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1990, 46 (1-4): : 397 - 404
  • [7] Molecular dynamics simulation of thin film nucleation through molecular cluster beam deposition: Effect of incident angle
    Hu, YH
    Sinnott, SB
    [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 195 (3-4): : 329 - 338
  • [8] FORMATION OF ZINC CLUSTERS IN IONIZED CLUSTER BEAM FILM DEPOSITION
    URBAN, FK
    FENG, SW
    NAINAPARAMPIL, JJ
    [J]. APPLIED PHYSICS LETTERS, 1992, 61 (10) : 1180 - 1181
  • [9] IONIZED CLUSTER BEAM DEPOSITION
    KNAUER, W
    POESCHEL, RL
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 456 - 460
  • [10] DETERMINATION OF ZINC CLUSTER-SIZE IN IONIZED CLUSTER BEAM FILM DEPOSITION
    URBAN, FK
    FENG, SW
    NAINAPARAMPIL, JJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1993, 74 (02) : 1335 - 1338