Fabrication and Testing of Solution-processed Carbon Nanotube Thin Film Transistor

被引:0
|
作者
Yi, Xun [1 ]
Fang, Liang [1 ]
Chi, Yaqing [1 ]
Sui, Bingcai [1 ]
机构
[1] Natl Univ Def Technol, Coll Comp, State Key Lab High Performance Comp, Changsha, Hunan, Peoples R China
来源
2014 INTERNATIONAL CONFERENCE ON INFORMATION SCIENCE, ELECTRONICS AND ELECTRICAL ENGINEERING (ISEEE), VOLS 1-3 | 2014年
关键词
Carbon Nanotube; Thin Film Transistor; Solution Process; Gate Leakage; NETWORKS; MOBILITY;
D O I
暂无
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
We described fabrication and testing of solutionprocessed SWCNT TFTs. A back-gated TFT test structure was fabricated by drop-coating SWCNT solution on SiO2 surface with Au electrodes. Output characteristic and switching characteristic were measured and analyzed. Over 4 decades' on/off ratio was obtained by using drop-coating at room temperature without any further optimization. Although we use a back-gated test structure, gate leak current was estimated at the level of picoampere. The resultant mobility level was 2x10(-3) cm(2) V(-1)s(-1), which is potential for future applications.
引用
收藏
页码:1170 / 1174
页数:5
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