Spontaneous immobilization of liposomes on electron-beam exposed resist surfaces

被引:25
|
作者
Kim, JM
Jung, HS
Park, JW
Yukimasa, T
Oka, H
Lee, HY
Kawai, T
机构
[1] Osaka Univ, Inst Sci & Ind Res, Ibaraki, Osaka 5670047, Japan
[2] Matsushita Elect Ind Co Ltd, Adv Technol Res Labs, Kyoto 6190237, Japan
[3] Tokyo Univ Technol, Sch Bion, Hachioji, Tokyo 1920982, Japan
关键词
D O I
10.1021/ja046169k
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We have found an interesting immobilization technique of liposomes on electron-beam exposed resist surfaces. The immobilized liposomes have been visualized by the atomic force microscope and have shown well-organized three-dimensional physical structures, in which the liposomes maintain their shapes and sizes similar to those of the original design in prepared solution. The immobilization is based on a strong static charge interaction between the resist surface and the liposomes. Further experiments show that very strong charge in the surfaces produces the firm immobilization of the liposome. We believe these findings can be related to various liposome applications such as drug delivery system, electrochemical or biosensors, and nanoscale membrane function studies.
引用
收藏
页码:2358 / 2362
页数:5
相关论文
共 50 条
  • [1] CHARACTERIZATION OF ELECTRON-BEAM EXPOSED OPTICAL RESIST
    TAM, NN
    COYNE, RD
    NEUREUTHER, AR
    SLAYMAN, CW
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 361 - 365
  • [2] ELECTRON-BEAM EFFECTS ON OXYGEN EXPOSED ALUMINUM SURFACES
    FONTAINE, JM
    LEEDEACON, O
    DURAUD, JP
    ICHIMURA, S
    LEGRESSUS, C
    SURFACE SCIENCE, 1982, 122 (01) : 40 - 54
  • [3] POLYSILOXANE RESIST AS A PROBE FOR ENERGY DEPOSITED IN ELECTRON-BEAM EXPOSED RESISTS
    PARASZCZAK, J
    KERN, D
    HATZAKIS, M
    BUCCHIGNANO, J
    ARTHUR, E
    ROSENFIELD, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1372 - 1377
  • [4] A STATISTICALLY BASED MODEL OF ELECTRON-BEAM EXPOSED, CHEMICALLY AMPLIFIED NEGATIVE RESIST
    TAM, NN
    LIU, HY
    SPANOS, C
    NEUREUTHER, AR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3362 - 3369
  • [5] RESIST MATERIALS FOR ELECTRON-BEAM LITHOGRAPHY
    LAI, JH
    JOURNAL OF IMAGING TECHNOLOGY, 1985, 11 (04): : 164 - 167
  • [6] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY
    YONEDA, Y
    KITAMURA, K
    NAITO, J
    KITAKOHJI, T
    OKUYAMA, H
    MURAKAWA, K
    POLYMER ENGINEERING AND SCIENCE, 1980, 20 (16): : 1110 - 1114
  • [7] RESIST CHARGING IN ELECTRON-BEAM LITHOGRAPHY
    LIU, W
    INGINO, J
    PEASE, RF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (05): : 1979 - 1983
  • [8] ELECTRON-BEAM RESIST MATERIALS FOR MICROFABRICATION
    KOGURE, O
    SUKEGAWA, K
    IMAMURA, S
    MIYOSHI, K
    SUGAWARA, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (03) : C103 - C104
  • [9] POLYDIALLYLORTHOPHTHALATE RESIST FOR ELECTRON-BEAM LITHOGRAPHY
    YONEDA, Y
    KITAMURA, K
    MIYAGAWA, M
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1982, 18 (03): : 453 - 467
  • [10] ELECTRON-BEAM TOOL RESIST INTERDEPENDENCE
    EIB, NK
    JONES, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1327 - 1330