Hydrogenated Amorphous Silicon Gate Driver With Low Leakage for Thin-Film Transistor Liquid Crystal Display Applications

被引:23
|
作者
Lin, Chih-Lung [1 ,2 ]
Deng, Ming-Yang [1 ]
Wu, Chia-En [1 ]
Hsu, Chih-Cheng [1 ]
Lee, Chia-Lun [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
[2] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 70101, Taiwan
关键词
Gate driver circuit; high resolution; hydrogenated amorphous silicon thin-film transistors (a-Si:H TFTs); low leakage; TFT-LCD APPLICATION; HIGH-RESOLUTION; CIRCUIT; TECHNOLOGY; DESIGN;
D O I
10.1109/TED.2017.2718730
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a new low-leakage gate driver circuit using hydrogenated amorphous silicon (a-Si:H) thin-film transistors (TFTs) for active-matrix liquid crystal display (AMLCD) applications. The pull-down TFTs are turned OFF to maintain the high driving capability of the proposed circuit. Four phase clock signals with a duty ratio of 33% are utilized to turn ON the pull-down TFTs in advance to improve the stability of the row line at V-L. The electrical characteristics of a fabricated a-Si: H TFT are measured to establish the model for HSPICE simulation to elucidate the effect of charge loss on the proposed circuit. Measurements confirm that the output waveforms of the proposed gate driver circuit remain identical to the initial waveforms and can be stabilized at V-L at 85 degrees C over 720 h, ensuring the feasibility of the use of the proposed gate driver circuit in AMLCDs.
引用
收藏
页码:3193 / 3198
页数:6
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