Stability of nitrogen in sputtered iron nitride thin films and multilayers

被引:0
|
作者
Chatbi, H [1 ]
Vergnat, M [1 ]
Bobo, JF [1 ]
Hennet, L [1 ]
机构
[1] Univ Nancy 1, Met Phys & Sci Mat Lab, CNRS, URA 155, F-54506 Vandoeuvre Nancy, France
关键词
D O I
10.1557/PROC-475-309
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Different phases of FeN thin films and Fe/FeN multilayers were prepared by reactive rf sputtering. The release of nitrogen and the crystallographic transformations during annealing were monitored by thermal desorption spectrometry and X-ray diffraction experiments. Finally, the diffusivity of nitrogen in the gamma'-Fe4N phase was evaluated.
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页码:309 / 314
页数:6
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