Stability of nitrogen in sputtered iron nitride thin films and multilayers

被引：0

作者：

Chatbi, H ^{[1
]}

Vergnat, M ^{[1
]}

Bobo, JF ^{[1
]}

Hennet, L ^{[1
]}

机构：

[1] Univ Nancy 1, Met Phys & Sci Mat Lab, CNRS, URA 155, F-54506 Vandoeuvre Nancy, France

来源：

MAGNETIC ULTRATHIN FILMS, MULTILAYERS AND SURFACES - 1997 | 1997年 / 475卷

关键词：

D O I：

10.1557/PROC-475-309

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Different phases of FeN thin films and Fe/FeN multilayers were prepared by reactive rf sputtering. The release of nitrogen and the crystallographic transformations during annealing were monitored by thermal desorption spectrometry and X-ray diffraction experiments. Finally, the diffusivity of nitrogen in the gamma'-Fe4N phase was evaluated.

引用

页码：309 / 314

页数：6

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