Nanocrystalline-Graphene-Tailored Hexagonal Boron Nitride Thin Films

被引:24
|
作者
Lee, Kang Hyuck [1 ]
Shin, Hyeon-Jin [2 ]
Kumar, Brijesh [3 ]
Kim, Han Sol [1 ]
Lee, Jinyeong [4 ]
Bhatia, Ravi [4 ]
Kim, Sang-Hyeob [5 ]
Lee, In-Yeal [4 ]
Lee, Hyo Sug [2 ]
Kim, Gil-Ho [4 ]
Yoo, Ji-Beom [1 ,4 ]
Choi, Jae-Young [2 ]
Kim, Sang-Woo [1 ,4 ]
机构
[1] Sungkyunkwan Univ SKKU, Sch Adv Mat Sci & Engn, Suwon 440746, South Korea
[2] Samsung Adv Inst Technol, Yongin 446712, South Korea
[3] Natl Univ Singapore, NUSNNI NanoCore, Singapore 117580, Singapore
[4] Sungkyunkwan Univ SKKU, SKKU Adv Inst Nanotechnol SAINT, Suwon 440746, South Korea
[5] Elect & Telecommun Res Inst, Taejon 305700, South Korea
基金
新加坡国家研究基金会;
关键词
boron nitride; chemical vapor deposition; electron microscopy; graphene; nanostructures; ANISOTROPIC THERMAL-EXPANSION; ATOMIC LAYERS; HETEROSTRUCTURES; CRYSTALLINE; NANOSHEETS; GROWTH; MOS2;
D O I
10.1002/anie.201405762
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Unintentionally formed nanocrystalline graphene (nc-G) can act as a useful seed for the large-area synthesis of a hexagonal boron nitride (h-BN) thin film with an atomically flat surface that is comparable to that of exfoliated single-crystal h-BN. A wafer-scale dielectric h-BN thin film was successfully synthesized on a bare sapphire substrate by assistance of nc-G, which prevented structural deformations in a chemical vapor deposition process. The growth mechanism of this nc-G-tailored h-BN thin film was systematically analyzed. This approach provides a novel method for preparing high-quality two-dimensional materials on a large surface.
引用
收藏
页码:11493 / 11497
页数:5
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