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Spin Interference In Silicon One-Dimensional Rings
被引:0
|作者:
Bagraev, N. T.
[1
]
Galkin, N. G.
[1
]
Gehlhoff, W.
[2
]
Klyachkin, L. E.
[1
]
Malyarenko, A. M.
[1
]
Shelykh, I. A.
机构:
[1] AF Ioffe Phys Tech Inst, St Petersburg 194021, Russia
[2] Tech Univ Berlin, D-10623 Berlin, Germany
来源:
关键词:
Spin interference;
silicon quantum well;
Spin-orbit interaction;
Aharonov-Bohm double-slit ring;
D O I:
暂无
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
We present the first findings of the spin transistor effect in the Rashba gate-controlled ring embedded in the p-type self-assembled silicon quantum well that is prepared on the n-type Si (100) surface. Firstly, the amplitude and phase sensitivity of the "0.7.(2e(2)/h)" feature of the hole quantum conductance staircase revealed by the quantum point contact inserted in the one of the arms of the double-slit ring are found to result from the Aharonov-Bohm (AB) and Aharonov-Casher (AC) conductance oscillations by varying respectively the value of the external magnetic field and the top-gate bias voltage. Secondly, the "0.7.(2e(2)/h)" feature appears to exhibit the fractional form revealed by both the plateuas and steps as a function of the top-gate bias voltage, with the variations of their positions in the external magnetic field.
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页码:457 / +
页数:2
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