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On-site comparison of quantum Hall effect resistance standards of the KRISS and the BIPM: ongoing key comparison BIPM.EM-K12
被引:4
|作者:
Gournay, P.
[1
]
Rolland, B.
[1
]
Chae, D-H
[2
]
Kim, W-S
[2
]
机构:
[1] Bur Int Poids & Mesures BIPM, Pavillon Breteuil, F-92312 Sevres, France
[2] Korea Res Inst Stand & Sci KRISS, 267 Gajeong Ro, Daejeon 34113, South Korea
来源:
关键词:
22;
D O I:
10.1088/0026-1394/57/1A/01010
中图分类号:
TH7 [仪器、仪表];
学科分类号:
0804 ;
080401 ;
081102 ;
摘要:
[No abstract available]
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页数:2
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