Comparison of dentinal crack incidence and of post removal time resulting from post removal by ultrasonic or mechanical force

被引:45
|
作者
Altshul, JH [1 ]
Marshall, G [1 ]
Morgan, LA [1 ]
Baumgartner, JC [1 ]
机构
[1] OREGON HLTH SCI UNIV,SCH DENT,DEPT ENDODONTOL,PORTLAND,OR 97201
关键词
D O I
10.1016/S0099-2399(97)80401-3
中图分类号
R78 [口腔科学];
学科分类号
1003 ;
摘要
The purpose of this study was to compare the frequency of canal and intradentin cracks after intraradicular post removal using ultrasonic instrumentation or the Gonan post removal system. Sixty cadaver teeth were divided into 4 groups of 15 teeth each: group 1, ultrasonic removal; group 2, Gonan post removal system; group 3, cemented posts not removed; and group 4, no posts. Groups 1 and 2 were contralateral matched pairs. Para Posts were placed in groups 1, 2, and 3 to 7 mm apical to the cementoenamel junction and luted with ZnPO4 cement. The time required for post removal in groups 1 and 2 was recorded. The teeth were extracted, sectioned, and examined. Canal and intradentin cracks were mapped, and their frequency was recorded at each level. There were statistically move cracks present in the ultrasonic group than the no post group. There were no other differences that reached statistical significance. It took significantly longer for post removal using the ultrasonic tip versus the Gonan system.
引用
收藏
页码:683 / 686
页数:4
相关论文
共 50 条
  • [41] Submicron particle removal in post-oxide chemical-mechanical planarization (CMP) cleaning
    Zhang, F
    Busnaina, A
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1999, 69 (04): : 437 - 440
  • [42] Post-Veraison Mechanical Leaf Removal Delays Berry Ripening on 'Sangiovese' and 'Montepulciano' Grapevines
    Lanari, V.
    Lattanzi, T.
    Borghesi, L.
    Silvestroni, O.
    Palliotti, A.
    I INTERNATIONAL WORKSHOP ON VINEYARD MECHANIZATION AND GRAPE AND WINE QUALITY, 2013, 978
  • [43] Experimental and modeling studies of particle removal in post silicon chemical mechanical planarization cleaning process
    Fernando, W. J. N.
    Lok, Y. H.
    Don, M. Mat
    Madhaven, V.
    Tay, W. S.
    THIN SOLID FILMS, 2011, 519 (10) : 3242 - 3248
  • [44] Effect of Chemical Mechanical Cleaning(CMC) on Particle Removal in Post-Cu CMP Cleaning
    Kim, Young-min
    Cho, Han-chul
    Jeong, Haedo
    TRANSACTIONS OF THE KOREAN SOCIETY OF MECHANICAL ENGINEERS A, 2009, 33 (10) : 1023 - 1028
  • [45] Effect of chelating agent on benzotriazole removal during post copper chemical mechanical polishing cleaning
    Miao, Yingxin
    Wang, Shengli
    Wang, Chenwei
    Liu, Yuling
    Sun, Mingbin
    Chen, Yang
    MICROELECTRONIC ENGINEERING, 2014, 130 : 18 - 23
  • [46] IODINE REMOVAL BY CONDENSATION FROM CONTAINMENT ATMOSPHERE IN POST EXTERNAL EVENT CONDITIONS
    KETTER, A
    WACHOLDER, E
    ELIAS, E
    NUCLEAR ENGINEERING AND DESIGN, 1988, 108 (03) : 385 - 393
  • [47] EVALUATION OF A PHYSICOCHEMICAL POST-TREATMENT FOR REMOVAL OF TURBIDITY FROM TANNERY WASTEWATER
    Jose Eduardo, Hernandez
    Eudimar, Lameda-Cuicas
    Maria Gabriela, Pire-Sierra
    Luisa, Molina-Quintero
    Maria Carolina, Pire-Sierra
    AGROINDUSTRIA SOCIEDAD Y AMBIENTE ASA, 2016, 2 (07): : 50 - 65
  • [48] POST BIOLOGICAL SOLIDS CHARACTERIZATION AND REMOVAL FROM PULP MILL EFFLUENTS.
    Peterson, R.R.
    Graham, J.L.
    Environmental Protection Technology Series. EPA, 1979,
  • [49] Effect of leather chemicals on Cr(III) removal from post tanning wastewater
    Shi, Bi (sibitannin@vip.163.com), 2018, American Leather Chemists Association (113):
  • [50] Effect of Leather Chemicals on Cr(III) Removal from Post Tanning Wastewater
    Tang, Yuling
    Zhou, Jianfei
    Zeng, Yunhang
    Zhang, Wenhua
    Shi, Bi
    JOURNAL OF THE AMERICAN LEATHER CHEMISTS ASSOCIATION, 2018, 113 (03): : 74 - 80