Effect of deep electron traps on contrast in AgCl emulsions

被引:0
|
作者
Hailstone, RK [1 ]
Vandenbroucke, D
De Keyzer, R
机构
[1] Rochester Inst Technol, Chester F Carlson Ctr Imaging Sci, Rochester, NY 14623 USA
[2] Agfa Gevaert NV, R&D Photog Res, Mortsel, Belgium
关键词
D O I
暂无
中图分类号
TB8 [摄影技术];
学科分类号
0804 ;
摘要
Computer simulation is used to study the effect of deep electron traps (irreversible one-electron traps) on contrast in AgCl. Theoretical response curves derived by Silberstein are used to demonstrate the highest contrast possible for a given threshold for developablilty. These curves are then used as benchmarks in the simulation study. Agreement with the theoretical curves is approached as recombination decreases, assuming the concentration of deep electron traps and their trapping radii allow their electron trapping to dominate latent-image formation. Sensitometric data on emulsions with RuCl5(NO)(2-) as a deep electron trap show that spectral sensitizing dyes that are expected to be good hole traps reduce or eliminate the high contrast induced by the dopant. This effect is consistent with the predictions obtained from computer simulation.
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页码:250 / 256
页数:7
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