Enhancement of third-harmonic generation in absorbing media

被引：19
|
作者：
Veres, G [1 ]
Matsumoto, S
Nabekawa, Y
Midorikawa, K
机构：
[1] KFKI Res Inst Particle & Nucl Phys, H-1525 Budapest, Hungary
[2] RIKEN, Laser Technol Lab, Wako, Saitama 3510198, Japan
来源：
APPLIED PHYSICS LETTERS | 2002年 / 81卷 / 20期
关键词：
D O I：
10.1063/1.1521248
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The efficiency of third-harmonic generation on glass-air interfaces near the focal point of a tightly focused laser beam is investigated for different material samples. It is found that highly absorbing materials give higher harmonic yield. Moreover, due to the systematic change of the third-harmonic yield with the absorption length, an estimation of the third-order susceptibility chi((3)) of absorbing samples can be given from absorption coefficient measurements. (C) 2002 American Institute of Physics.
引用
收藏
页码：3714 / 3716
页数：3
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