Enhancement of third-harmonic generation in absorbing media

被引:19
|
作者
Veres, G [1 ]
Matsumoto, S
Nabekawa, Y
Midorikawa, K
机构
[1] KFKI Res Inst Particle & Nucl Phys, H-1525 Budapest, Hungary
[2] RIKEN, Laser Technol Lab, Wako, Saitama 3510198, Japan
关键词
D O I
10.1063/1.1521248
中图分类号
O59 [应用物理学];
学科分类号
摘要
The efficiency of third-harmonic generation on glass-air interfaces near the focal point of a tightly focused laser beam is investigated for different material samples. It is found that highly absorbing materials give higher harmonic yield. Moreover, due to the systematic change of the third-harmonic yield with the absorption length, an estimation of the third-order susceptibility chi((3)) of absorbing samples can be given from absorption coefficient measurements. (C) 2002 American Institute of Physics.
引用
收藏
页码:3714 / 3716
页数:3
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