Optical and structural properties of beta-FeSi2 layers on Si fabricated by triple Fe-56 ion implantations

被引：0
|
作者：
Katsumata, H [1 ]
Shen, HL [1 ]
Kobayashi, N [1 ]
Makita, Y [1 ]
Hasegawa, M [1 ]
Shibata, H [1 ]
Kimura, S [1 ]
Obara, A [1 ]
Uekusa, S [1 ]
机构：
[1] ELECTROTECH LAB,TSUKUBA,IBARAKI 305,JAPAN
来源：
ION BEAM MODIFICATION OF MATERIALS | 1996年
关键词：
D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：943 / 946
页数：4
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