High-speed InGaP/GaAs HBT's using a simple collector undercut technique to reduce base-collector capacitance

被引:29
|
作者
Chen, WL
Chau, HF
Tutt, M
Ho, MC
Kim, TS
Henderson, T
机构
[1] Corporate R. and D., System Components Laboratory, Texas Instruments Inc., Dallas
关键词
D O I
10.1109/55.596935
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High-speed InGaP/GaAs HBT's were fabricated using a simple collector undercut (CU) technique to physically remove the collector material underneath the extrinsic base region by selective etching for seducing base-collector capacitance (C-BC) The best HBT's achieved a f(T) of 80 GHz and a f(max) (MSG/MAG) of 171 GHz. To our knowledge, this is the highest f(max) (MSG/MAG) ever reported for the InGaP/GaAs HBT's. Compared to the HBT's without CU's, the CU HBT's shored a factor of 1.38 times improvement in the highest achievable f(max) (MSG/MAG) due to the significant reduction of the C-BC.
引用
收藏
页码:355 / 357
页数:3
相关论文
共 50 条
  • [32] AlGaAs/GaAs heterojunction bipolar transistors with reduced base-collector capacitance fabricated using selective metallorganic chemical vapor deposition
    Son, Jeong-Hwan
    Kim, Chang-Tae
    Hong, Song-Cheol
    Kwon, Young-Se
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (2 B): : 1085 - 1088
  • [33] Reduction of the base-collector capacitance of heterostructure bipolar transistors using regrowth over a patterned subcollector.
    Hamm, RA
    Lee, M
    Pinzone, C
    Kopf, R
    Ryan, R
    Pullela, R
    Tate, A
    Melendes, M
    Melendes, R
    Werder, D
    COMPOUND SEMICONDUCTOR POWER TRANSISTORS II AND STATE-OF-THE-ART PROGRAM ON COMPOUND SEMICONDUCTORS (SOTAPOCS XXXII), 2000, 2000 (01): : 329 - 338
  • [34] Type-II base-collector performance advantages and limitations in high-speed NpN double heterojunction bipolar transistors (DHBTs)
    Bolognesi, CR
    Dvorak, MW
    Watkins, SP
    IEICE TRANSACTIONS ON ELECTRONICS, 2003, E86C (10): : 1929 - 1934
  • [35] GaAsHBTs with reduced collector capacitance for high-speed ICs and microwave power applications
    Mochizuki, K
    COMPOUND SEMICONDUCTORS 2002, 2003, 174 : 195 - 202
  • [36] Physically based analytical modeling of base-collector charge, capacitance and transit time of III-VHBT's
    van der Toorn, R
    Paasschens, JCJ
    Havens, RJ
    2004 IEEE CSIC SYMPOSIUM, TECHNICAL DIGEST 2004: 26TH ANNIVERSARY: COMPOUNDING YOUR CHIPS IN MONTEREY, 2004, : 283 - 286
  • [37] InGaP/GaAs0.57P0.28Sb0.15/GaAs Double HBT With Weakly Type-II Base/Collector Junction
    Chin, Yu-Chung
    Lin, Hao-Hsiung
    Huang, Chao-Hsing
    IEEE ELECTRON DEVICE LETTERS, 2012, 33 (04) : 489 - 491
  • [38] High-speed InGaP/GaAs transistors with a sidewall base contact structure
    Mochizuki, Kazuhiro
    Tanoue, Tomonori
    Oka, Tohru
    Ouchi, Kiyoshi
    Hirata, Kohji
    Nakamura, Tohru
    IEEE, Piscataway, NJ, United States (18):
  • [39] High-speed InGaP/GaAs transistors with a sidewall base contact structure
    Mochizuki, K
    Tanoue, T
    Oka, T
    Ouchi, K
    Hirata, K
    Nakamura, T
    IEEE ELECTRON DEVICE LETTERS, 1997, 18 (11) : 562 - 564
  • [40] High-speed InGaP/GaAs HBTs with an ultra-thin base
    Oka, T
    Ouchi, K
    Mochizuki, K
    Nakamura, T
    COMPOUND SEMICONDUCTORS 1998, 1999, (162): : 285 - 290