Duplex stainless steel passive film electrical properties studied by in situ current sensing atomic force microscopy

被引：70
|
作者：
Guo, L. Q. [1 ]
Lin, M. C. [1 ]
Qiao, L. J. [1 ]
Volinsky, Alex A. [1 ,2 ]
机构：
[1] Univ Sci & Technol Beijing, Key Lab Environm Fracture MOE, Ctr Corros & Protect, Beijing 100083, Peoples R China
[2] Univ S Florida, Dept Mech Engn, Tampa, FL 33620 USA
来源：
CORROSION SCIENCE | 2014年 / 78卷
基金：
中国国家自然科学基金;
关键词：
Stainless steel; AFM; XPS; Passive films; ELECTRONIC-STRUCTURE; CHEMICAL-COMPOSITION; OXIDE-FILMS; PHOTOELECTROCHEMICAL ANALYSIS; SEMICONDUCTING PROPERTIES; AISI; 304-STAINLESS-STEEL; CORROSION BEHAVIOR; PITTING CORROSION; BUFFER SOLUTION; TEMPERATURE;
D O I：
10.1016/j.corsci.2013.08.031
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The duplex stainless steel passive film electrical properties before and after passivation were investigated by current sensing atomic force microscopy and X-ray photoelectron spectroscopy (XPS). The current maps and band gap energies extracted from I-V curves show that the conductivity of passive film covering austenite and ferrite is different and decreases with increasing film formation potential due to the changes in the passive film thickness and composition, confirmed by XPS analysis. I-V curves reveal that the passive films exhibit p-type or n-type semiconducting properties depending on the film formation potential, attributed to different film chemical composition, supported by XPS results. (C) 2013 Elsevier Ltd. All rights reserved.
引用
收藏
页码：55 / 62
页数：8
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