Combined effects of hydrogen annealing on morphological, electrical and structural properties of graphene/r-sapphire

被引:17
|
作者
Ning, Jing [1 ]
Wang, Dong [1 ]
Yan, Jingdong [1 ]
Han, Dang [1 ]
Chai, Zheng [1 ]
Cai, Weiwei [2 ]
Zhang, Jincheng [1 ]
Hao, Yue [1 ]
机构
[1] Xidian Univ, State Key Discipline Lab Wide Band Gap Semicond T, Xian 710071, Peoples R China
[2] Xiamen Univ, Dept Phys, Lab Nanoscale Condense Matter Phys, Xiamen 361005, Peoples R China
关键词
FILMS; TRANSISTORS;
D O I
10.1016/j.carbon.2014.03.062
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We proposed a comprehensive study on the combined effects of hydrogen thermal annealing process on the morphological, structural and electrical properties of graphene transferred on r-plane sapphire (1-102). We found that although thermal annealing can remove the polymeric residues, unintentional p-type doping of polymeric residues and structural breakages arise simultaneously with the in-plane tensile strain. Also, the forming mechanism of cracks and p-type doping effect were investigated through Raman spectroscopy, atomic force microscopy, non-contact Hall and high resolution X-ray photo-electron spectroscopy. It revealed thermal annealing process has a combined influence on the performance of the hydrogen annealed samples with a critical point, which was similar to 250 degrees C in this work. When the annealing temperature was over the critical point, significant p-type doping effects were included in a dominant position because of graphene with in-plane strain. The results can be important for the fabrication or chemical processing of graphene-based materials and devices. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:262 / 270
页数:9
相关论文
共 50 条
  • [21] Effects of hydrogen implantation on the structural and electrical properties of nickel silicide
    Choi, CJ
    Ok, YW
    Hullavarad, SS
    Seong, TY
    Lee, KM
    Lee, JH
    Park, YJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (09) : G517 - G521
  • [22] Effects of Deposition Conditions on the Structural and Acoustic Characteristics of (11(2)over-bar0) ZnO Thin Films on R-Sapphire Substrates
    Wang, Yan
    Wasa, Kiyotaka
    Zhang, Shu-yi
    IEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, 2012, 59 (08) : 1613 - 1617
  • [23] Impact of Annealing Temperature on MnO2 Thin Films: Morphological, Structural, and Electrical Properties
    Lynrah, Stacy A.
    Ying, Lim Ying
    Chinnamuthu, P.
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2023, 36 (04) : 666 - 672
  • [24] Annealing temperature effect on structural, optical, morphological and electrical properties of CdS/Si(100) nanostructures
    Y. Al-Douri
    M. Ameri
    A. Bouhemadou
    R. Khenata
    Microsystem Technologies, 2016, 22 : 2529 - 2541
  • [25] Effects of sapphire annealing on the structural properties of AlN thin films grown by molecular beam epitaxy
    Liu, Yun
    Zhang, Jia
    PHYSICA B-CONDENSED MATTER, 2010, 405 (06) : 1643 - 1646
  • [26] Effects of ion irradiation and annealing on optical and structural properties of CeO2 films on sapphire
    Chen, M. Y.
    Zu, X. T.
    Xiang, X.
    Zhang, H. L.
    PHYSICA B-CONDENSED MATTER, 2007, 389 (02) : 263 - 268
  • [27] Structural, morphological, and electrical properties of ZnSe nanostructures: Effects of Zn precursors
    Gupta, Tripti
    Chauhan, R. P.
    SURFACES AND INTERFACES, 2021, 25
  • [28] Influence of annealing on the structural,optical and electrical properties of indium oxide films deposited on c-sapphire substrate
    赵鸿铎
    弭伟
    张楷亮
    赵金石
    OptoelectronicsLetters, 2016, 12 (01) : 39 - 42
  • [29] Morphological and Microstructural Evolution and Related Impurity Incorporation in Non-Polar a-Plane GaN Grown on r-Sapphire Substrates
    Jiang Ren-Yuan
    Xu Sheng-Rui
    Zhang Jin-Cheng
    Jiang Teng
    Jiang Hai-Qing
    Wang Zhi-Zhe
    Fan Yong-Xiang
    Hao Yue
    CHINESE PHYSICS LETTERS, 2015, 32 (09)
  • [30] Influence of annealing on the structural, optical and electrical properties of indium oxide films deposited on c-sapphire substrate
    Zhao H.-D.
    Mi W.
    Zhang K.-L.
    Zhao J.-S.
    Optoelectronics Letters, 2016, 12 (1) : 39 - 42