Real-time XPS monitoring of atomic layer deposition of HfO2 on Si surfaces

被引：0
|
作者：
Shayesteh, Payam [1 ]
Gallet, Jean-Jacques [2 ]
Bournel, Fabrice [2 ]
Schnadt, Joachim [1 ]
机构：
[1] Lund Univ, Phys, Lund, Sweden
[2] Univ Paris 06, Paris, France
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2017年 / 253卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
77-COLL
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页数：2
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