Investigation of defects in sputtered W/B4C multilayers

被引：3
|
作者：
Jiang, Hui [1 ]
Yan, Shuai [1 ]
Zhu, Jingtao [2 ]
Dong, Zhaohui [1 ]
Zheng, Yi [1 ]
He, Yumei [1 ]
Li, Aiguo [1 ]
机构：
[1] Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Shanghai 201204, Peoples R China
[2] Tongji Univ, Inst Precis Opt Engn, Minist Educ, Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2015年 / 357卷
基金：
中国国家自然科学基金;
关键词：
Multilayer; Oxidation; Stress; Defect; ATOMIC-FORCE MICROSCOPY; OPTICAL APPLICATIONS; DIFFUSE-SCATTERING; TUNGSTEN-OXIDE; THIN-FILMS; COATINGS; REFLECTIVITY; INTERFACE; CRACKING; STRESS;
D O I：
10.1016/j.apsusc.2015.09.161
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Sputtered W/B4C multilayers were determined by X-ray photoelectron spectroscopy, Raman scattering spectroscopy, scanning electron microscopy and atomic force microscopy synthetically. Two defect modes were observed in multilayers: buckle delamination and oxidation. This paper compares the chemical composition varies along multilayer depth and at different regions and tries to interpret the mechanism of defect evolution. The X-ray grazing incidence reflection profiles were compared to the theoretical value to estimate the influences from different defects. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码：1180 / 1186
页数：7
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