Investigation of defects in sputtered W/B4C multilayers

被引：3
|
作者：
Jiang, Hui [1 ]
Yan, Shuai [1 ]
Zhu, Jingtao [2 ]
Dong, Zhaohui [1 ]
Zheng, Yi [1 ]
He, Yumei [1 ]
Li, Aiguo [1 ]
机构：
[1] Chinese Acad Sci, Shanghai Inst Appl Phys, Shanghai Synchrotron Radiat Facil, Shanghai 201204, Peoples R China
[2] Tongji Univ, Inst Precis Opt Engn, Minist Educ, Key Lab Adv Microstruct Mat, Shanghai 200092, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2015年 / 357卷
基金：
中国国家自然科学基金;
关键词：
Multilayer; Oxidation; Stress; Defect; ATOMIC-FORCE MICROSCOPY; OPTICAL APPLICATIONS; DIFFUSE-SCATTERING; TUNGSTEN-OXIDE; THIN-FILMS; COATINGS; REFLECTIVITY; INTERFACE; CRACKING; STRESS;
D O I：
10.1016/j.apsusc.2015.09.161
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Sputtered W/B4C multilayers were determined by X-ray photoelectron spectroscopy, Raman scattering spectroscopy, scanning electron microscopy and atomic force microscopy synthetically. Two defect modes were observed in multilayers: buckle delamination and oxidation. This paper compares the chemical composition varies along multilayer depth and at different regions and tries to interpret the mechanism of defect evolution. The X-ray grazing incidence reflection profiles were compared to the theoretical value to estimate the influences from different defects. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码：1180 / 1186
页数：7
相关论文
共 50 条
  • [1] INTERFACIAL BONDING IN W/C AND W/B4C MULTILAYERS
    JANKOWSKI, AF
    SCHRAWYER, LR
    WALL, MA
    CRAIG, WW
    MORALES, RI
    MAKOWIECKI, DM
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (04): : 2914 - 2918
  • [2] Thermally induced interface changes in W/B4C multilayers
    Rao, P. N.
    Rai, S. K.
    Sinha, A. K.
    Singh, M. N.
    Lodha, G. S.
    THIN SOLID FILMS, 2015, 589 : 268 - 271
  • [3] STRUCTURAL STABILITY OF HEAT-TREATED W/C AND W/B4C MULTILAYERS
    JANKOWSKI, AF
    SCHRAWYER, LR
    WALL, MA
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (10) : 5162 - 5168
  • [4] STABILITY OF SPUTTERED MO/BN, W/BN, MO/B4C, AND W/B4C SOFT-X-RAY MULTILAYERS UNDER EXPOSURE TO MULTIPOLE-WIGGLER RADIATION
    YANAGIHARA, M
    MAYAMA, K
    GOTO, Y
    KUSUNOKI, I
    ASAOKA, S
    MAEZAWA, H
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 1993, 334 (2-3): : 638 - 642
  • [5] CHARACTERIZATION OF WCX/B4C MULTILAYERS SPUTTERED IN REACTIVE ARGON/METHANE ATMOSPHERES
    DIEHL, PE
    LUND, MW
    MADSEN, DW
    MCINTYRE, LC
    SMITH, DJ
    THIN SOLID FILMS, 1994, 239 (01) : 57 - 70
  • [6] CHARACTERIZATION OF MO/B4C MULTILAYERS
    JANKOWSKI, AF
    PERRY, PL
    THIN SOLID FILMS, 1991, 206 (1-2) : 365 - 368
  • [7] Chemical modification of B4C cap layers on Pd/B4C multilayers
    Supruangnet, Ratchadaporn
    Morawe, Christian
    Peffen, Jean-Christophe
    Nakajima, Hideki
    Rattanasuporn, Surachet
    Photongkam, Pat
    Jearanaikoon, Nichada
    Busayaporn, Wutthikri
    APPLIED SURFACE SCIENCE, 2016, 367 : 347 - 353
  • [8] Fabrication, structure and reflectivity of W/C and W/B4C multilayers for hard X-ray
    Russian Acad of Sciences, Moscow, Russia
    Opt Commun, 1-2 (133-142):
  • [9] FABRICATION, STRUCTURE AND REFLECTIVITY OF W/C AND W/B4C MULTILAYERS FOR HARD X-RAY
    YAKSHIN, AE
    KHODOS, II
    ZHELEZNIAK, IM
    ERKO, AI
    OPTICS COMMUNICATIONS, 1995, 118 (1-2) : 133 - 142
  • [10] Thermal stability of Mo/B4C multilayers
    Barthelmess, Miriam
    Bajt, Sasa
    DAMAGE TO VUV, EUV, AND X-RAY OPTICS III, 2011, 8077
12345