Preferred orientation and hardness enhancement of TiN/CrN superlattice coatings deposited by reactive magnetron sputtering

被引：90
|
作者：
Yang, Q
He, C
Zhao, LR
Immarigeon, JP
机构：
[1] Natl Res Council Canada, Struct Mat & Prop Lab, Inst Aerosp Res, Ottawa, ON K1A 0R6, Canada
[2] Nortel Networks, Dept C115 3500, Nepean, ON K2H 8E9, Canada
来源：
SCRIPTA MATERIALIA | 2002年 / 46卷 / 04期
关键词：
superlattice; coatings; sputtering; hardness; preferred orientation;
D O I：
10.1016/S1359-6462(01)01241-6
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
TiN/CrN superlattice coatings with various bilayer periods are deposited by reactive magnetron sputtering. The preferred orientations of the superlattices can be controlled through selecting either (200)-oriented TiN or (111)-oriented CrN as the starting layer for deposition. Changing the preferred orientation from (111) to (200) can significantly increase hardness enhancements. (C) 2002 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：293 / 297
页数：5
相关论文
共 50 条
  • [31] Corrosion of TiN, (TiAl)N and CrN hard coatings produced by magnetron sputtering
    Cunha, L
    Andritschky, M
    Rebouta, L
    Silva, R
    THIN SOLID FILMS, 1998, 317 (1-2) : 351 - 355
  • [32] Mechanical Characterization of CrN/CrAlN Multilayer Coatings Deposited by Magnetron Sputtering System
    Khlifi Kaouther
    Dhiflaoui Hafedh
    Zoghlami Lassaad
    Ben Cheikh Larbi Ahmed
    Journal of Materials Engineering and Performance, 2015, 24 : 4077 - 4082
  • [33] TRIBOLOGY OF ZrN, CrN AND TiAlN THIN FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
    Ruden, Alexander
    Gonzalez, Juan M.
    Restrepo, Johans S.
    Cano, Michell F.
    Sequeda, Federico
    DYNA-COLOMBIA, 2013, 80 (178): : 95 - 100
  • [34] Effect of substrate negative bias voltage on preferred orientation of the compound Ti/TiN nanofilm deposited by magnetron sputtering
    Xing, Y.-Q. (jdjw@hebau.edu.cn), 1600, Editorial Office of Transactions of Materials and Heat Treatment (35):
  • [35] MULTILAYER COATINGS Ti/TiN, Cr/CrN AND W/WN DEPOSITED BY MAGNETRON SPUTTERING FOR IMPROVEMENT OF ADHESION TO BASE MATERIALS
    Hornik, J.
    Krum, S.
    Tondl, D.
    Puchnin, M.
    Sachr, P.
    Cvrcek, L.
    ACTA POLYTECHNICA, 2015, 55 (06) : 388 - 392
  • [36] Biocompatibility of Titanium Oxynitride Coatings Deposited by Reactive Magnetron Sputtering
    Kim, I. I.
    Surovtseva, M. A.
    Poveshchenko, O., V
    Bondarenko, N. A.
    Chepeleva, E., V
    Zhuravleva, I. Yu
    BULLETIN OF EXPERIMENTAL BIOLOGY AND MEDICINE, 2022, 173 (06) : 779 - 782
  • [37] Effect of carbon on TiAlCN coatings deposited by reactive magnetron sputtering
    Zhang, Xuhai
    Jiang, Jianqing
    Yuqiao, Zeng
    Lin, Jianliang
    Wang, Fengli
    Moore, John J.
    SURFACE & COATINGS TECHNOLOGY, 2008, 203 (5-7): : 594 - 597
  • [38] Biocompatibility of Titanium Oxynitride Coatings Deposited by Reactive Magnetron Sputtering
    I. I. Kim
    M. A. Surovtseva
    O. V. Poveshchenko
    N. A. Bondarenko
    E. V. Chepeleva
    I. Yu. Zhuravleva
    Bulletin of Experimental Biology and Medicine, 2022, 173 : 779 - 782
  • [39] Characterization of the hardness and the substrate fluxes during reactive magnetron sputtering of TiN
    Mahieu, S.
    Depla, D.
    De Gryse, R.
    SURFACE & COATINGS TECHNOLOGY, 2008, 202 (11): : 2314 - 2318
  • [40] Nanolayered multilayer coatings of CrN/CrAlN prepared by reactive DC magnetron sputtering
    Barshilia, Harish C.
    Deepthi, B.
    Selvakumar, N.
    Jain, Anjana
    Rajam, K. S.
    APPLIED SURFACE SCIENCE, 2007, 253 (11) : 5076 - 5083
12345