Tuning from thermionic emission to ohmic tunnel contacts via doping in Schottky-barrier nanotube transistors

被引:54
|
作者
Chen, Yung-Fu
Fuhrer, Michael S. [1 ]
机构
[1] Univ Maryland, Dept Phys, College Pk, MD 20742 USA
[2] Univ Maryland, Ctr Superconduct Res, College Pk, MD 20742 USA
关键词
D O I
10.1021/nl061379b
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Electrical power > 1 mW is dissipated in semiconducting single-walled carbon nanotube devices in a vacuum. After high-power treatment, devices exhibit lower on currents and intrinsic, ambipolar behavior with near-ideal thermionic emission from Schottky barriers of height one-half the band gap. Upon exposure to air, devices recover p-type behavior, with positive threshold and ohmic contacts. The air-exposed state cannot be explained by a change in contact work function but instead is due to doping of the nanotube.
引用
收藏
页码:2158 / 2162
页数:5
相关论文
共 50 条
  • [31] Metal contacts in carbon nanotube field-effect transistors: Beyond the Schottky barrier paradigm
    Palacios, J. J.
    Tarakeshwar, P.
    Kim, Dae M.
    PHYSICAL REVIEW B, 2008, 77 (11)
  • [32] The performance of in situ grown Schottky-barrier single wall carbon nanotube field-effect transistors
    Zhou, Zhixian
    Eres, Gyula
    Jin, Rongying
    Subedi, Alaska
    Mandrus, David
    Kim, Eugene H.
    NANOTECHNOLOGY, 2009, 20 (08)
  • [33] Temperature dependence of carrier transport and electrical characteristics of Schottky-barrier carbon nanotube field effect transistors
    Ossaimee, Mahmoud
    El Sabbagh, Mona
    Gamal, Salah
    MICRO & NANO LETTERS, 2016, 11 (02) : 114 - 117
  • [34] SCHOTTKY-BARRIER INHOMOGENEITIES IN AU-NI AND AU-CR CONTACTS TO INP-OHMIC CONTACT APPLICATIONS
    CLAUSEN, T
    LEISTIKO, O
    CHORKENDORFF, I
    LARSEN, J
    APPLIED SURFACE SCIENCE, 1994, 74 (04) : 287 - 295
  • [35] Schottky-barrier height tuning of Ni and Pt germanide/n-Ge contacts using dopant segregation
    Mueller, M.
    Zhao, O. T.
    Urban, C.
    Sandow, C.
    Breuer, U.
    Mantl, S.
    2008 9TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1-4, 2008, : 153 - +
  • [36] Performance comparison of zero-Schottky-barrier and doped contacts carbon nanotube transistors with strain applied
    Wahab, Md. Abdul
    Alam, Khairul
    NANO-MICRO LETTERS, 2010, 2 (02) : 126 - 133
  • [37] Performance comparison of zero-Schottky-barrier and doped contacts carbon nanotube transistors with strain applied
    Md. Abdul Wahab
    Khairul Alam
    Nano-Micro Letters, 2010, 2 : 126 - 133
  • [38] Performance of Zero-Schottky-Barrier and Doped Contacts Single and Double Walled Carbon Nanotube Transistors
    Wahab, Md. Abdul
    Alam, Khairul
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (02)
  • [39] Performance comparison of zero-Schottky-barrier and doped contacts carbon nanotube transistors with strain applied
    Md.Abdul Wahab
    Khairul Alam
    Nano-Micro Letters, 2010, 2 (02) : 126 - 133
  • [40] Analytic calculation of the gate edge capacitance for schottky-barrier field-effect transistors and metallization of contacts on gallium arsenide
    Adamov, YF
    RADIOTEKHNIKA I ELEKTRONIKA, 1996, 41 (07): : 890 - 894