Laser ablation of toluene liquid for surface micro-structuring of silica glass

被引：34

作者：

Niino, H. ^{[1
]}

Kawaguchi, Y. ^{[1
]}

Sato, T. ^{[1
]}

Narazaki, A. ^{[1
]}

Gumpenberger, T. ^{[1
]}

Kurosaki, R. ^{[1
]}

机构：

[1] Natl Inst Adv Ind Sci & Technol, Photon Res Inst, Tsukuba, Ibaraki 3058565, Japan

来源：

APPLIED SURFACE SCIENCE | 2006年 / 252卷 / 13期

关键词：

laser-induced backside wet etching (LIBWE); diode-pumped solid state UV laser; silica glass; UV absorption;

D O I：

10.1016/j.apsusc.2005.07.084

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Microstructures with well-defined micropatterns were fabricated on the surfaces of silica glass using a laser-induced backside wet etching (LIBWE) method by diode-pumped solid state (DPSS) UV laser at the repetition rate of 10 kHz. For a demonstration of flexible rapid prototyping as mask-less exposure system, the focused laser beam was directed to the sample by galvanometer-based point scanning system. Additionally, a diagnostics study of plume propagation in the ablated products of toluene solid film was carried out with an intensified CCD (ICCD) camera. (c) 2005 Elsevier B.V All rights reserved.

引用

页码：4387 / 4391

页数：5

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