Study of internal stress of amorphous Ni-W alloy films

被引：5
|
作者：
Liu, R. [1 ]
Wang, H. [1 ]
Li, X. -P. [1 ]
Ding, G. -F. [1 ]
机构：
[1] Shanghai Jiao Tong Univ, Key Lab Thin Film & Microfabricat Technol, Minist Educ, Natl Key Lab Micro Nano Fabricat Technol,Res Inst, Shanghai 200030, Peoples R China
来源：
MATERIALS SCIENCE AND TECHNOLOGY | 2009年 / 25卷 / 08期
关键词：
Internal stress; Ni-W; Crystal structure; Amorphous; NICKEL-TUNGSTEN ALLOY; MECHANICAL-PROPERTIES; NANOCRYSTALLINE NI;
D O I：
10.1179/174328408X311071
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The present paper introduces the effect of W content, pH, current density, pulse ratio and stress reducers on the internal stress of Ni-W alloy films in the system of citrate amine HEDP. Morphologies of Ni-W alloy films were also investigated. The results showed that the internal stress was closely related to W content of alloy films. pH had an important effect on the internal stress of amorphous Ni-W alloy films and there were some cracks in the electrodeposits surface when pH value was in the range 5.5-6.0. Internal stress varied obviously with different current densities, however there were no obvious cracks in amorphous Ni-W alloy films. Internal stress was affected slightly by pulse ratio and stress reducers, and morphologies of amorphous Ni-W alloy films had little change with different pulse ratios and stress reducers.
引用
收藏
页码：960 / 968
页数：9
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