Preparation and characterization of Fe-based III-V diluted magnetic semiconductor (Ga, Fe)As

被引:33
|
作者
Haneda, S [1 ]
Yamaura, M [1 ]
Takatani, Y [1 ]
Hara, K [1 ]
Harigae, S [1 ]
Munekata, H [1 ]
机构
[1] Tokyo Inst Technol, Imaging Sci & Engn Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan
关键词
III-V compound semiconductor; diluted magnetic semiconductor; iron; molecular beam epitaxy;
D O I
10.1143/JJAP.39.L9
中图分类号
O59 [应用物理学];
学科分类号
摘要
The Fe-based III-V diluted magnetic semiconductor (III-V-DMS), (Ga, Fe)As, has been grown successfully on GaAs(001) substrates by molecular beam epitaxy at a substrate temperature T-s rangirig from 260-350 degrees C, Secondary ion mass spectroscopy analysis has exhibited that the film composition can be expressed by Ga1-xFexAs. X-ray diffraction data have indicated that the lattice constant of Ga1-xFexAs decreases with increasing Fe composition. Magnetization data have exhibited that epilayers are predominantly paramagnetic, however, their detailed behavior differs from that of Mn-based DMS systems. The work has demonstrated that the physical properties of III-V-DMS can be changed significantly by the choice of transition metals.
引用
收藏
页码:L9 / L12
页数:4
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