A planar amorphous Si1-xGex separated-absorption-multiplication avalanche photo diode

被引:3
|
作者
Torres, A
Gutierrez, EA
机构
[1] INAOE, Z.P. 72000, Puebla
关键词
D O I
10.1109/55.641448
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, we report a simple innovative and CMOS compatible planar Separated-Absorption-Multiplication (SAM) amorphous Si1-xGex avalanche photo diode (SAMAPD) for short-distance optical-fiber communication systems, The spectral response of this SAMAPD extends up to 0.93 mu m with a bandwidth of 1.9 GHz. Due to its low-temperature process budget it can be post-fabricated in a CMOS wafer, which makes it ideal for building monolithic submicron CMOS fiber optic detector systems.
引用
收藏
页码:568 / 570
页数:3
相关论文
共 50 条
  • [31] INGAAS-INP SEPARATED ABSORPTION AND MULTIPLICATION REGIONS AVALANCHE PHOTO-DIODE USING LIQUID-PHASE AND VAPOR-PHASE EPITAXIES
    ANDO, H
    YAMAUCHI, Y
    NAKAGOME, H
    SUSA, N
    KANBE, H
    IEEE JOURNAL OF QUANTUM ELECTRONICS, 1981, 17 (02) : 250 - 254
  • [32] Infrared absorption in Si/Si1-xGex/Si quantum wells -: art. no. 085329
    Ridene, S
    Boujdaria, K
    Bouchriha, H
    Fishman, G
    PHYSICAL REVIEW B, 2001, 64 (08): : 853291 - 853299
  • [33] SCHOTTKY-BARRIER FORMATION ON ELECTRON-BEAM DEPOSITED AMORPHOUS SI1-XGEX-H ALLOYS AND AMORPHOUS (SI/SI1-XGEX)-H MODULATED STRUCTURES
    CHRISTOU, A
    TZANETAKIS, P
    HATZOPOULOS, Z
    KYRIAKIDIS, G
    TSENG, W
    WILKINS, BR
    APPLIED PHYSICS LETTERS, 1986, 48 (06) : 408 - 410
  • [34] Strong photoluminescence from Si1-xGex/Si quantum wells on non-planar Si substrate
    Inst of Semiconductors, The Chinese Acad of Sciences, Beijing, China
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1997, 18 (01): : 10 - 15
  • [36] Direct observation of lattice strain in Si1-xGex/Si crystals using planar channeling patterns
    Breese, MBH
    deKerckhove, DG
    King, PJC
    Smulders, PJM
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 132 (01): : 177 - 187
  • [37] Transport properties of boron-doped crystallized amorphous Si1-xGex films
    Raz, T
    Edelman, F
    Komem, Y
    Stolzer, M
    Zaumseil, P
    JOURNAL OF APPLIED PHYSICS, 1998, 84 (08) : 4343 - 4350
  • [38] Direct observation of lattice strain in Si1-xGex/Si crystals using planar channeling patterns
    Breese, M.B.H.
    de Kerckhove, D.G.
    King, P.J.C.
    Smulders, P.J.M.
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 1997, 132 (01): : 177 - 187
  • [39] Defects in amorphous Si1-xGex alloys: An explanation of electron spin resonance signals
    Kim, E
    Lee, YH
    Lee, HJ
    Hwang, YG
    EUROPHYSICS LETTERS, 1997, 40 (02): : 147 - 152
  • [40] ELECTRICAL-PROPERTIES OF HYDROGENATED AMORPHOUS SI1-XGEX THIN-FILMS
    PISARKIEWICZ, T
    STAPINSKI, T
    KOLODZIEJ, A
    ACTA PHYSICA POLONICA A, 1991, 79 (2-3) : 203 - 206