Measurements towards the materials sources of line-edge roughness in chemically amplified photoresists

被引：0
|
作者：
Lin, Eric K.
Prabhu, Vivek M.
Vogt, Bryan D.
Kang, Shuhui
Rao, Ashwin
Satija, Sushil K.
Wu, Wen-li
Turnquest, Karen
机构：
[1] Natl Inst Stand & Technol, Div Polymers, Gaithersburg, MD 20899 USA
[2] Natl Inst Stand & Technol, Ctr Neutron Res, Gaithersburg, MD 20899 USA
[3] Int SEMATECH, Lithog Dept, Austin, TX USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2006年 / 231卷
关键词：
D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
267-POLY
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页数：1
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