Morphology and growth kinetics of organic thin films deposited by hot wall epitaxy

被引:26
|
作者
Andreev, AY [1 ]
Teichert, C
Hlawacek, G
Hoppe, H
Resel, R
Smilgies, DM
Sitter, H
Sariciftci, NS
机构
[1] Univ Linz, Inst Semicond & Solid State Phys, A-4040 Linz, Austria
[2] Univ Min & Met Leoben, Dept Phys, A-8700 Leoben, Austria
[3] Univ Linz, LIOS, A-4040 Linz, Austria
[4] Graz Univ Technol, Inst Solid State Phys, A-8010 Graz, Austria
[5] Cornell Univ, CHESS G Line, Ithaca, NY 14853 USA
关键词
organic epitaxy; crystalline thin films; atomic force microscopy; X-ray diffraction;
D O I
10.1016/j.orgel.2004.01.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this work we have used atomic force microscopy and X-ray diffraction by synchrotron radiation to investigate the growth kinetics and morphology of para-sexiphenyl layers. The results of our investigations can be summarized as follows: (a) para-sexiphenyl grows on mica epitaxialy; (b) a rearrangement from randomly distributed small para-sexiphenyl islands with compact shape to elongated islands occurs during the growth if the critical island density is reached; (c) with further increase of the growth time the islands become elongated, quickly reaching a fixed asymptotic width while their height remains much smaller than their length and width. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:23 / 27
页数:5
相关论文
共 50 条
  • [21] Weak epitaxy growth of organic semiconductor thin films
    Yang, Junliang
    Yan, Donghang
    CHEMICAL SOCIETY REVIEWS, 2009, 38 (09) : 2634 - 2645
  • [22] Growth and characterization of Bi-doped PbS thin films prepared by hot-wall epitaxy
    Abe, S
    Masumoto, K
    Suto, K
    JOURNAL OF CRYSTAL GROWTH, 1997, 181 (04) : 367 - 373
  • [23] Morphology and magnetic analysis of MnSb films grown by hot-wall epitaxy
    Low, BL
    Ong, CK
    Han, GC
    Gong, H
    Liew, TYF
    JOURNAL OF APPLIED PHYSICS, 1998, 84 (02) : 973 - 977
  • [24] Structural characterization of hot wall deposited cadmium selenide thin films
    Velumani, S
    Narayandass, SK
    Mangalaraj, D
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1998, 13 (09) : 1016 - 1024
  • [25] PIEZOELECTRIC CDS THIN-FILMS DEPOSITED BY THE HOT WALL TECHNIQUE
    ROHDE, HJ
    THIN SOLID FILMS, 1983, 110 (01) : L125 - L127
  • [26] Structural and optical properties of hot wall deposited CdSe thin films
    Velumani, S
    Mathew, X
    Sebastian, PJ
    Narayandass, SK
    Mangalaraj, D
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2003, 76 (03) : 347 - 358
  • [28] Hot Wall epitaxy of C-60 thin films on mica and their characterization
    Stifter, D
    Sitter, H
    FULLERENE SCIENCE AND TECHNOLOGY, 1996, 4 (02): : 277 - 295
  • [29] Growth and characterization of semiconducting Pb1-xMgxS thin films prepared by hot-wall epitaxy
    Abe, S
    Masumoto, K
    JOURNAL OF CRYSTAL GROWTH, 2001, 223 (03) : 394 - 398
  • [30] Growth kinetics of plasma deposited microcrystalline silicon thin films
    Amanatides, E.
    Mataras, D.
    SURFACE & COATINGS TECHNOLOGY, 2011, 205 : S178 - S181