Optical identification of MoS2/graphene heterostructure on SiO2/Si substrate

被引：21

作者：

Xu, Haiteng ^{[1
]}

He, Dawei ^{[1
]}

Fu, Ming ^{[1
]}

Wang, Wenshuo ^{[1
]}

Wu, Hongpeng ^{[1
]}

Wang, Yongsheng ^{[1
]}

机构：

[1] Beijing Jiaotong Univ, Inst Optoelect Technol, Minist Educ, Key Lab Luminescence & Opt Informat, Beijing 100044, Peoples R China

来源：

OPTICS EXPRESS | 2014年 / 22卷 / 13期

关键词：

MOS2; PHOTOLUMINESCENCE; GRAPHENE; LAYERS;

D O I：

10.1364/OE.22.015969

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Chemical vapor deposition (CVD) method is considered to be an efficient way to prepare Van der Waals heterostructure. However, accurately and hurtlessly identifying the layers number of MoS2 in the heterostructure is still a challenge. Here, we calculated the expected contrast between MoS2/graphene heterostructure and underlying SiO2/Si substrate by using a Fresnel law based model. And we indicated that contrast at blue and green incident light is ideal for visibility and layer number detecting. Our measured value showed good agreement with calculated ones. And Raman spectrum helped to confirm our speculation. (C)2014 Optical Society of America

引用

页码：15969 / 15974

页数：6

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