Buried interfaces in Mo/Si multilayers studied by soft-X-ray emission spectroscopy

被引：29

作者：

Miyata, N ^{[1
]}

Ishikawa, S ^{[1
]}

Yanagihara, M ^{[1
]}

Watanabe, M ^{[1
]}

机构：

[1] Tohoku Univ, Sci Measurements Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 11期

关键词：

soft-X-ray emission; Si L-23 emission; buried layer; buried interface; multilayer; synchrotron radiation; nondestructive analysis;

D O I：

10.1143/JJAP.38.6476

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We measured the Si L-23 soft-X-ray emission spectra for Mo/Si multilayers using monochromatized synchrotron radiation near the Si L-23 absorption threshold. On the basis of the spectral analysis, it was determined that the inter-faces of Mo/Si multilayers consist of Mo3Si interlayers of 0.8 +/- 0.1 nm in thickness. This study confirmed that soft-X-ray emission spectroscopy is a useful method of studying buried layers and interfaces nondestructively.

引用

页码：6476 / 6478

页数：3

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