Buried interfaces in Mo/Si multilayers studied by soft-X-ray emission spectroscopy

被引：29
|
作者：
Miyata, N [1 ]
Ishikawa, S [1 ]
Yanagihara, M [1 ]
Watanabe, M [1 ]
机构：
[1] Tohoku Univ, Sci Measurements Res Inst, Aoba Ku, Sendai, Miyagi 9808577, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 11期
关键词：
soft-X-ray emission; Si L-23 emission; buried layer; buried interface; multilayer; synchrotron radiation; nondestructive analysis;
D O I：
10.1143/JJAP.38.6476
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We measured the Si L-23 soft-X-ray emission spectra for Mo/Si multilayers using monochromatized synchrotron radiation near the Si L-23 absorption threshold. On the basis of the spectral analysis, it was determined that the inter-faces of Mo/Si multilayers consist of Mo3Si interlayers of 0.8 +/- 0.1 nm in thickness. This study confirmed that soft-X-ray emission spectroscopy is a useful method of studying buried layers and interfaces nondestructively.
引用
收藏
页码：6476 / 6478
页数：3
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