Possibility of strain control in AlN layer grown by MOVPE on (0001) 6H-SiC with GaN/AlN buffer

被引:0
|
作者
Kurimoto, M [1 ]
Nakada, T [1 ]
Ishihara, Y [1 ]
Shibata, M [1 ]
Takano, T [1 ]
Yamamoto, J [1 ]
Honda, T [1 ]
Kawanishi, H [1 ]
机构
[1] Kohgakuin Univ, Dept Elect Engn, Hachioji, Tokyo 1920015, Japan
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关键词
D O I
10.1002/(SICI)1521-396X(199911)176:1<665::AID-PSSA665>3.0.CO;2-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A tensile-strained AlN layer along the a-axis was grown on a (0001)6H-SiC substrate with a (GaN/AlN) buffer layer by metalorganic vapor phase epitaxy using an alternating source feeding (ASF) technique. It was experimentally demonstrated that the strain in-the AlN layer was affected by the growrh conditions of the buffer layer. On the other hand, the AlN layer grown directly on a substrate without the buffer layer exhibits compressive strain along the a-asis. Strain control in the AlN layer using the ASF buffer is proposed.
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页码:665 / 669
页数:5
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