Instability, self-organization and pattern formation in thin soft films

被引:125
|
作者
Mukherjee, Rabibrata [1 ]
Sharma, Ashutosh [2 ,3 ]
机构
[1] Indian Inst Technol, Dept Chem Engn, Instabil & Soft Patterning Lab, Kharagpur 721302, W Bengal, India
[2] Indian Inst Technol, Dept Chem Engn, Kanpur 208016, Uttar Pradesh, India
[3] Indian Inst Technol, Nanosci Ctr, Kanpur 208016, Uttar Pradesh, India
关键词
VAN-DER-WAALS; HIERARCHICAL STRUCTURE FORMATION; FIELD-INDUCED INSTABILITIES; VISCOELASTIC POLYMER-FILMS; LEAKY DIELECTRIC FILMS; LIQUID-FILMS; ELECTRIC-FIELD; CONTACT INSTABILITY; SURFACE INSTABILITY; DEWETTING DYNAMICS;
D O I
10.1039/c5sm01724f
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The free surface of a thin soft polymer film is often found to become unstable and self-organizes into various meso-scale structures. In this article we classify the instability of a thin polymer film into three broad categories, which are: category 1: instability of an ultra-thin (<100 nm) viscous film engendered by amplification of thermally excited surface capillary waves due to interfacial dispersive van der Waals forces; category 2: instability arising from the attractive inter-surface interactions between the free surface of a soft film exhibiting room temperature elasticity and another rigid surface in its contact proximity; and category 3: instability caused by an externally applied field such as an electric field or a thermal gradient, observed in both viscous and elastic films. We review the salient features of each instability class and highlight how characteristic length scales, feature morphologies, evolution pathways, etc. depend on initial properties such as film thickness, visco-elasticity (rheology), residual stress, and film preparation conditions. We emphasize various possible strategies for aligning and ordering of the otherwise isotropic structures by combining the essential concepts of bottom-up and top-down approaches. A perspective, including a possible future direction of research, novelty and limitations of the methods, particularly in comparison to the existing patterning techniques, is also presented for each setting.
引用
收藏
页码:8717 / 8740
页数:24
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