Pattern formation by rim instability in dewetting polymer thin films

被引:0
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作者
Asano, Y [1 ]
Hoshino, A
Miyaji, H
Miyamoto, Y
Fukao, K
机构
[1] Kyoto Univ, Grad Sch Sci, Dept Phys, Kyoto 6068502, Japan
[2] Kyoto Univ, Fac Integrated Human Studies, Dept Fundamental Sci, Kyoto 6068501, Japan
[3] Kyoto Inst Technol, Dept Polymer Sci & Engn, Kyoto 6068585, Japan
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中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The dewetting process of thin polystyrene films from 5 to 50nm in thickness on a silicon substrate is investigated. A spreading dry patch formed on dewetting is surrounded with a circular rim, which stores the liquid matter expelled from the dewetted region. When the diameter of the patch exceeds a thickness-dependent critical value, the rim is deformed by morphological instability; the instability gives rise to the diversity of self-organization processes of liquid ridges or droplets formed eventually on partially wettable substrates. A morphological phase diagram of the deformed rim is given in the diameter of dry patch and the initial film thickness. In the final stage of dewetting, liquid droplets arrange to form a "polygon network" in thick films and "polygons with random droplets" in thin films. The origin of the instability is discussed in terms of surface free energy.
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页码:186 / 198
页数:13
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