Quantum confinement and band offsets in amorphous silicon quantum wells

被引:4
|
作者
Jarolimek, K. [1 ]
de Groot, R. A. [2 ]
de Wijs, G. A. [2 ]
Zeman, M. [1 ]
机构
[1] Delft Univ Technol, PVMD DIMES, NL-2600 GB Delft, Netherlands
[2] Radboud Univ Nijmegen, Inst Mol & Mat, NL-6525 AJ Nijmegen, Netherlands
关键词
MOLECULAR-DYNAMICS; CRYSTAL INTERFACE; SI; BARRIER; HETEROJUNCTIONS; DEPOSITION; SURFACES; GROWTH; FILMS; OXIDE;
D O I
10.1103/PhysRevB.90.125430
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Quantum wells (QWs) are nanostructures consisting of alternating layers of a low and high band-gap semiconductor. The band gap of QWs can be tuned by changing the thickness of the low band-gap layer, due to quantum confinement effects. Although this principle is well established for crystalline materials, there is still controversy for QWs fabricated from amorphous materials: How strong are the confinement effects in amorphous QWs, where, because of the disorder, the carriers are localized to start with? We prepare an atomistic model of QWs based on a-Si: H to gain insight into this problem. The electronic structure of our atomistic QWs model is described with first-principles density functional theory, allowing us to study the confinement effects directly. We find that the quantum confinement effect is rather weak, compared to experimental results on a similar system.
引用
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页数:7
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