Materials for double patterning strategies: Development and application

被引：3

作者：

Perret, D. ^{[1
]}

Simon, J. ^{[3
]}

Gaugiran, S. ^{[3
]}

Cutler, C. ^{[2
]}

Cardolaccia, T. ^{[2
]}

Pikon, A. ^{[1
]}

Guerin, I. ^{[3
]}

Lapeyre, C. ^{[3
]}

Derrough, S. ^{[3
]}

Szmanda, C. ^{[2
]}

Trefonas, P. ^{[2
]}

机构：

[1] Rohm & Haas Elect Mat, F-38054 Grenoble 9, France

[2] Rohm & Haas Elect Mat, Marlborough, MA 01752 USA

[3] CEA Grenoble, LETI D2NT LLIT, F-38054 Grenoble 9, France

来源：

MICROELECTRONIC ENGINEERING | 2009年 / 86卷 / 4-6期

关键词：

Lithography; Photoresist; Double patterning; Freezing; 3D;

D O I：

10.1016/j.mee.2009.01.051

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Double patterning has become the most promising approach to overcome the 32 run node challenges. Several schemes have been proposed to simplify the process, each requiring very specific materials that still have to be developed and optimized. The resist platform presented here is an image lock material which has been developed to meet the Litho-Litho-Etch (or 2P1E) approach. In this paper, we present the material development of dedicated polymers for the double imaging technique. The lithographic properties of these materials are evaluated, in term of process window (PW) and Line Edge Roughness (LER). Successful patterning of 50 and 45 nm lines at 90 nm pitch has been obtained. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：757 / 760

页数：4

共 50 条

[21] Development of materials and processes for negative tone development toward 32-nm node 193-nm immersion double-patterning process
Tarutani, Shinji
Hideaki, Tsubaki
Kamimura, Sou
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVI, 2009, 7273
[22] Process parameter influence to negative tone development process for double patterning
Tarutani, Shinji
Kamimura, Sou
Yokoyama, Jiro
ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXVII, PTS 1 AND 2, 2010, 7639
[23] Development of layout split algorithms and printability evaluation for double patterning technology
Chiou, Tsann-Bim
Socha, Robert
Chen, Hong
Chen, Luoqi
Hsu, Stephen
Nikolsky, Peter
van Oosten, Anton
Chen, Alek C.
OPTICAL MICROLITHOGRAPHY XXI, PTS 1-3, 2008, 6924
[24] DEVELOPMENT AND APPLICATION OF SUPERPLASTIC MATERIALS
KOBAYASHI, M
MIYAGAWA, M
TETSU TO HAGANE-JOURNAL OF THE IRON AND STEEL INSTITUTE OF JAPAN, 1986, 72 (15): : 2001 - 2009
[25] Strategies for Patterning Silicon Nanostructures with Diblock Copolymers, in View of Application to Microelectronics and Optoelectronics
Gay, Guillaume
Baron, Thierry
Jalaguier, Eric
Agraffeil, Claire
Salhi, Billel
Chevolleau, Thierry
Cunge, Gilles
Aissou, Karim
De Salvo, Barbara
SCIENCE OF ADVANCED MATERIALS, 2011, 3 (03) : 490 - 495
[26] Materials for lithographic patterning
Ito, Hiroshi
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2009, 237
[27] Double Stage Turbocharger Control Strategies Development
Chasse, A.
Moulin, P.
Gautier, P.
Albrecht, A.
Fontvieille, L.
Guinois, A.
Doleac, L.
SAE INTERNATIONAL JOURNAL OF ENGINES, 2009, 1 (01) : 636 - 646
[28] Application challenges with double patterning technology (DPT) beyond 45nm
Park, Jungchul
Hsu, Stephen
Van Den Broeke, Douglas
Chen, J. Fung
Dusa, Mircea
Socha, Robert
Finders, Jo
Vleeming, Bert
van Oosten, Anton
Nikolsky, Peter
Wiaux, Vincent
Hendrickx, Eric
Bekaert, Joost
Vandenberghe, Geert
PHOTOMASK TECHNOLOGY 2006, PTS 1 AND 2, 2006, 6349
[29] Development of biofiltration processes and strategies for their application
Paca, J
WIDER APPLICATION AND DIFFUSION OF BIOREMEDIATION TECHNOLOGIES: THE AMSTERDAM '95 WORKSHOP, 1996, : 235 - 243
[30] Strategies for Web Application Development Methodologies
Sharma, Ravi
Kumar, Shipra Ravi
Gupta, Keshav
2016 IEEE INTERNATIONAL CONFERENCE ON COMPUTING, COMMUNICATION AND AUTOMATION (ICCCA), 2016, : 160 - 165

← 1 2 3 4 5 →