High-Linearity AlGaN/GaN FinFETs for Microwave Power Applications

被引:82
|
作者
Zhang, Kai [1 ]
Kong, Yuechan [1 ]
Zhu, Guangrun [1 ]
Zhou, Jianjun [1 ]
Yu, Xinxin [1 ]
Kong, Cen [1 ]
Li, Zhonghui [1 ]
Chen, Tangsheng [1 ]
机构
[1] Nanjing Elect Devices Inst, Sci & Technol Monolith Integrated Circuits & Modu, Nanjing 210016, Jiangsu, Peoples R China
关键词
AlGaN/GaN; FinFETs; T-shaped gate; output power density; linearity characteristics;
D O I
10.1109/LED.2017.2687440
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, we have proposed a novel AlGaN/GaN FinFET featuring T-shaped gate and extremely linearity of transconductance characteristics (G(m)). The formation of AlGaN/GaN nano-fins only in the gate opening region is enabled by a developed fabrication process, which is simple and well compatible with the conventional one. When normalized to effective channel width, the fabricated FinFET delivers a 1.45 times higher current density and a 1.66 times higher output power density as high as 11.3 W/mm at 8 GHz compared with the planar HEMTs, along with clearly improved linearity characteristics thanks to a flatter Gm response afforded by much lower source access resistance. To the best of our knowledge, this is the first demonstration of superior power performance of high-linearity GaN FinFETs, indicating significant advantages of tri-gate configuration over planar HEMTs for microwave power applications.
引用
收藏
页码:615 / 618
页数:4
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