Can the dynamics and reactivity of Mu+ and Mu- in heavily doped n-type and p-type silicon be studied?

被引:1
|
作者
Mansour, A. I. [1 ]
Chow, K. H. [1 ]
Salman, Z. [2 ,3 ]
Fan, I. [1 ]
King, P. J. C. [3 ]
Hitti, B. [4 ]
Jung, J. [1 ]
Cottrell, S. P. [3 ]
机构
[1] Univ Alberta, Dept Phys, Edmonton, AB T6G 2G7, Canada
[2] Univ Oxford, Dept Phys, Clarendon Lab, Oxford OX1 3PU, England
[3] Rutherford Appleton Lab, ISIS Facil, Didcot OX11 0QX, Oxon, England
[4] TRIUMF, Vancouver, BC V6T 2A3, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
Hydrogen; Muonium; Site; Diffusion; Silicon; BOND-CENTERED MUONIUM; CRYSTALLINE SILICON; INTERSTITIAL ZINC; HYDROGEN; SEMICONDUCTORS; SI; ZNSE; GAN;
D O I
10.1016/j.physb.2008.11.160
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We report on the stability and dynamics of muonium centers in heavily doped p-type and n-type Si crystals. The measurements were conducted and were carried out at the ISIS facility in the United Kingdom. This allows us to detect weak dipolar interactions between the probe and its surrounding host nuclei. The Mu(+) center was successfully observed in the p-type Si:B sample, where its dipolar interaction with the Si-29 neighboring nuclei was detected. The stability, diffusivity and reactivity of this positive diamagnetic center were clearly identified. On the other hand, the neutral Mu(BC)(0) center appear to dominate the dynamics in the n-type Si:As sample due to its very rapid spin exchange rate (10(6) MHz), and thus it conceals the effect due to the Mu(-) center. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:831 / 833
页数:3
相关论文
共 50 条
  • [31] COMPENSATING EFFECTS OF PLATINUM IN N-TYPE AND P-TYPE SILICON
    CATANIA, ME
    CALCAGNO, L
    COFFA, S
    CAMPISANO, SU
    RASPAGLIESI, M
    FERLA, G
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1991, 52 (02): : 119 - 122
  • [32] NONLINEARITY OF PIEZORESISTANCE EFFECT IN P-TYPE AND N-TYPE SILICON
    MATSUDA, K
    KANDA, Y
    YAMAMURA, K
    SUZUKI, K
    SENSORS AND ACTUATORS A-PHYSICAL, 1990, 21 (1-3) : 45 - 48
  • [33] MODELING OF HYDROGEN DIFFUSION IN N-TYPE AND P-TYPE SILICON
    MATHIOT, D
    PHYSICAL REVIEW B, 1989, 40 (08): : 5867 - 5870
  • [34] IMPURITY EFFECTS ON CONDUCTION IN HEAVILY DOPED N-TYPE SILICON
    FINETTI, M
    MAZZONE, AM
    JOURNAL OF APPLIED PHYSICS, 1977, 48 (11) : 4597 - 4600
  • [35] MEASUREMENT OF HOLE MOBILITY IN HEAVILY DOPED N-TYPE SILICON
    SWIRHUN, SE
    DELALAMO, JA
    SWANSON, RM
    IEEE ELECTRON DEVICE LETTERS, 1986, 7 (03) : 168 - 173
  • [36] PIEZORESISTANCE AND MAGNETIC SUSCEPTIBILITY IN HEAVILY DOPED N-TYPE SILICON
    SASAKI, W
    KINOSHITA, J
    JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1968, 25 (06) : 1622 - +
  • [37] Some transport coefficients in heavily doped n-type silicon
    Elfagd, Y
    Workalemahu, B
    Sharma, SK
    PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 2001, 227 (02): : 549 - 555
  • [38] ORBACH RELAXATION PROCESS IN HEAVILY DOPED N-TYPE SILICON
    OCHIAI, Y
    MATSUURA, E
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 56 (02): : K109 - K112
  • [39] The donor nature of muonium in undoped, heavily n-type and p-type InAs
    King, P. D. C.
    Veal, T. D.
    McConville, C. F.
    King, P. J. C.
    Cox, S. F. J.
    Celebi, Y. G.
    Lichti, R. L.
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2009, 21 (07)
  • [40] Thermal oxidation of silicon carbide: A comparison of n-type and p-type doped epitaxial layers
    Fu, Xiao-An
    Okino, Kenji
    Mehregany, Mehran
    APPLIED PHYSICS LETTERS, 2011, 98 (04)