Study on the fabrication and measurement of polymer/Si arrayed waveguide grating multiplexer

被引：0

作者：

Wang, F ^{[1
]}

Zhao, Y ^{[1
]}

Zhang, DM ^{[1
]}

Cui, ZC ^{[1
]}

Yi, MB ^{[1
]}

Liu, SY ^{[1
]}

Sun, W ^{[1
]}

机构：

[1] Jilin Univ Reg, State Key Lab Integrated Optoelect, Changchun 130023, Peoples R China

来源：

APOC 2002: ASIA-PACIFIC OPTICAL AND WIRELESS COMMUNICATIONS; MATERIALS AND DEVICES FOR OPTICAL AND WIRELESS COMMUNICATIONS | 2002年 / 4905卷

关键词：

arrayed waveguide grating; polymer; reaction ion etching; aluminum mask;

D O I：

10.1117/12.480995

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper, a 9 X 9 Polymer/Si AWG was designed and fabricated. The cladding material is poly-methyl-methacrylate-co-glyciclyl methacrylate (PMMA-GMA) and the core material is the mixture of PMMA-GMA and bis-phonel-A epoxy. During the fabrication process of the Polymer/Si AWG device, We used aluminum as mask on polymer instead of conventional photoresist as mask. The results show that the device is good for the wavelength division multiplexing (WDM) system. The output characteristics of the device were measured by a system based on the tapered fiber. The results show that our polymer/Si AWG meets the designed device well.

引用

页码：139 / 142

页数：4

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