Fabrication of arrayed waveguide grating based on SOI material

被引：0

作者：

Fang, Q ^{[1
]}

Li, F ^{[1
]}

Liu, YL ^{[1
]}

机构：

[1] Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China

来源：

JOURNAL OF INFRARED AND MILLIMETER WAVES | 2005年 / 24卷 / 02期

关键词：

multiplexer/demultiplexer; arrayed waveguide grating ( AWG); channel spacing; central wavelength; adjacent channel crosstalk;

D O I：

暂无

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An arrayed waveguide grating based on SOI material was fabricated by inductive coupled plasma (ICP) etching technology. The central wavelength of the device was designed at 1.5509 mu m and the channel spacing was 200 GHz. Comparing with the values of the design, the differences of the central wavelength and the channel spacing in the test were 0.28 nm and 0.02 nm, respectively. The adjacent channel crosstalk was about 10 dB, and the uniformity of the five channels' insertion loss was only 0.7 dB. The results show that the device can be used as a demultiplexer.

引用

页码：143 / 146

页数：4

共 18 条

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